The manufacturing of semiconductor lasers relies on a tightly integrated chain of advanced photonics technologies that enable precise control over epitaxy, micro-optics, and nanofabrication. Epitaxial growth via MOCVD or MBE are used to engineer quantum wells, DBR stacks, and waveguide layers with sub-nanometer accuracy for edge-emitting laser diodes, DFB lasers, and VCSELs. Subsequent lithography and etching steps define ridge geometries, current apertures, gratings, and cavity structures using deep-UV or nanoimprint techniques. Thin-film photonics is essential for depositing high-reflectivity coatings, AR/HR mirrors and dielectric passivation layers that set cavity losses and polarization control. And photonics-based testing and metrology, including interferometry, near-field/far-field scanning or automated wafer-level probing, supports process control and binning. Together, these photonics technologies enable high-volume manufacturing of reliable, wavelength-stable semiconductor lasers for different communications, sensing, and industrial applications.
In this online meeting, we invite the whole supply chain to discuss the challenges related with the manufacturing of semiconductor lasers and to discover the latest developments both for the fabrication and monitoring of these sources.